Mask for photolithography

Different mask for different application

A photolithography mask is an opaque plate or film with transparent areas that allow light to shine through in a defined pattern. They are commonly used in photolithography processes, but are also used in many other applications by a wide range of industries and technologies. It exists different kind of mask for different application namely based on the resolution needed.

Plastic mask


Plastic mask properties:

  • Low price
  • Low resolution (> 6µm)
  • Weak stability
  • Easy to handle
  • Wavelenght > 350 nm

Glass (Soda lime) mask


Glass mask properties:

  • Good price/quality ratio
  • High resolution (>=2µm)
  • Stable
  • Easy to clean but can break
  • Wavelength > 350nm

Quartz mask


Quartz mask properties:

  • Quite expensive
  • High resolution (>=2µm)
  • Very stable
  • Easy to clean but can break
  • Wavelength > 180nm

Advices and design

More than the photomask themselves, we do advice and can do the design for researchers. Since our team is mainly composed of PhD we have good knowledges in several fields such as droplets, T-sensor, solution gradient, mixing, sorting, trapping, multilevel,… We will be happy to discuss about your project and think with you.

Principally for beginners we want to show that microfluidic can be accessible by every one namely when we are helped by the good people.


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For further information and quotes, do not hesitate to contact our team of experts: or phone: +33(0).782.831.207