Mask for photolithography

Different mask for different applications

A photolithography mask is an opaque plate or film with transparent areas that allow light to shine through in a defined pattern. It is commonly used in photolithography processes, but is also used in many other applications by a wide range of industries and technologies. It exists different kinds of mask for different applications namely based on the resolution needed.

Plastic mask


Plastic mask properties:

    • Low price
    • Low resolution (> 6µm)
    • Weak stability
    • Easy to handle
  • Wavelenght > 350 nm

Glass (Soda lime) mask


Glass mask properties:

  • Good price/quality ratio
  • High resolution (>=2µm)
  • Stable
  • Easy to clean but can break
  • Wavelength > 350nm

Quartz mask


Quartz mask properties:

    • Quite expensive
    • High resolution (>=2µm)
    • Very stable
    • Easy to clean but can break
  • Wavelength > 180nm

Advices and design

More than providing the photomasks themselves, we advise and can do the design for researchers. Since our team is mainly composed of PhD, we have good knowledges in several fields such as droplets, T-sensor, solution gradient, mixing, sorting, trapping, multilevel,… We will be happy to discuss about your project and think about your application with you.

Our main goal is to show that microfluidic can be achievable by everyone including beginners if they are helped by the good people.


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For further information and quotes, do not hesitate to contact our team of experts: or phone: +33(0).782.831.207